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Research on the Influence of Entrepreneur’s Patent Participation and Patent Strategy on Enterprise Performance
SUN Yinglin,TANG Heng,CHENG Long,SU Wencheng
Jiangsu University, Zhenjiang, Jiangsu, China

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Abstract  Based on the grounded theory, this study constructs a theoretical framework of inventor-entrepreneurs’ patent participation, patent strategy and enterprise performance. Taking 358 sci-tech innovation board enterprises as samples, the two indicators called patent participation breadth and patent participation depth are designed and empirical tests are conducted by regression analysis method. The results show that: Firstly, in a certain range, inventor-entrepreneurs’ participation in patent can improve the profitability and growth ability of enterprises. Meanwhile, they may be more cautious or even resistant to the expansion of enterprise scale. Secondly, when the breadth of entrepreneurs’ patent participation is lower than the critical value, the quantity-oriented patent output strategy is advocated. The depth of entrepreneurs’ patent participation is always negatively correlated with the patent number. Thirdly, when the breadth or depth of entrepreneurs’ patent participation is lower than the critical value respectively, the slow-oriented and the quality-oriented strategies are advocated. While if the value is higher than the critical value, the fast-oriented strategy is advocated. The mediating effect of quantity and speed-oriented strategy in the actual development of enterprises is more obvious and universal.
Key wordsentrepreneur      inventor      technical participation      patent      enterprise performance     
Received: 27 July 2021     
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SUN Yinglin
TANG Heng
CHENG Long
SU Wencheng
Cite this article:   
SUN Yinglin,TANG Heng,CHENG Long等. Research on the Influence of Entrepreneur’s Patent Participation and Patent Strategy on Enterprise Performance[J]. Chinese Journal of Management, 2022, 19(10): 1522-.
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http://manu68.magtech.com.cn/Jwk_glxb/EN/     OR     http://manu68.magtech.com.cn/Jwk_glxb/EN/Y2022/V19/I10/1522
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